technical data
product name
chemical structure
absorbance wavelength
features
applications
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tr-habi-101
261nm
moderate curing speed and high resolution
dry film resist
tds
tr-habi-102
327nm, 349nm
high solubility and photosensitivty, few developing sludge, absorption wavelength at 400nm
dry film resist
tds
tr-habi-107

269nm
halogen-free
dry film resist
tds
tr-habi-119h

264nm, 376nm
dual-band initiator(355nm, 405nm)
dry film resist
tds